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| High Purity SiC Materials for High-temperature &
LPCVD Processes Asahi Glass offers a full line of high-purity recrystallized & CVD-Coated SiC furnace components for Vertical, Horizontal and Single Wafer processes. Asahi Glass SiC materials are preferred worldwide by furnace manufacturers and wafer fabs whose processes demand the use of high-purity precision components. With ppb purity levels and a melting point of >1400(deg), Asahi Glass CVD-Coated SiC is the material of choice for High-Temperature and LPCVD processes. Asahi Glass SiC is virtually impervious to acid etc, resulting in consistent and repeatable performance time after time. Asahi Glass SiC materials are available in 150mm - 300mm for all major horizontal and vertical systems. |
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High Purity SiC Components for 300mm
With in-house custom design capabilities and state-of-the-art process control, our design teams have led the industry with a full line of leading-edge of 300mm products for both high-temperature and LPCVD processes. Asahi Glass works hand-in-hand with wafer fabs around the world to fine-tune their 300mm processes and ensure consistent high purity performance products which maximize yield and throughput. |
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Dummy Wafers
Asahi Glass Dummy Wafers are high purity, 100% SiC-CVD material, formed by an advanced CVD process. The exceptional material properties of these advanced wafers offer a reusable, cost effective alternative to silicon wafers when used as dummy or "filler" wafers. Asahi Glass dummy wafers are available in 150mm - 300mm. |
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Comparison of Acid Inertness
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